Intel- F68 Process Engineering Engineer Intern

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Job Title: F68 Process Engineering Engineer Intern

Job Type: Intern

Open Position: 10

Location: Dalian

Intel Dalian 300mm wafer factory (F68) Process Engineering Team is looking for some highly motivated and skillful interns to join our team.
This internship offers a variety of opportunities to acquire 300mm wafer manufacturing practical experiences.
In this position, you will be responsible for:
1)Learn and understand the Semi-Conductor Manufacturing General Process /Equipment Function,
2)Learn and observe the overall Equipment Demo/Installation Process, understand key stakeholder and communication management.
3)Help and Support Process Engineers for the PAS tracking and productivity improvement.
4)Other Area/Module Specific Projects
Specific function areas and/or toolsets:
- Litho scanner, track, process integration and litho metrology
- Diffusion, implant, RTA, CVD, PVD, Cu plating, CMP, Thin Film Metrology, defect metrology equipment, and wafer handling equipment
- Wet clean and/or Etch and Plasma Etch and/or Ash

Qualification

You should be a full-time college student pursuing a Bachelor or Master Degreee in Electronics, Material Science, Chemistry, Chemical Engineering, Physics, Electrical Engineering, Computer Engineering or equivalent background. Additional qualifications include:

- Commit to work 3-4 days a week.
- Recognize and perform Intel's value and culture, show ability to work in flexible and continuously changing environment.
- Demonstrate organizational and communication skill to manage assigned tasks successfully and commit to deliverables.
- Show strong self-leaning ability, actively participate in assigned tasks and drive integrated solutions.
- Good usage of technical problem solving and demonstrate creativity.
- Exercise good engineering judgment, have a strong knowledge of statistics and experimental design, and with the ability to apply the knowledge to daily work.

Please contact : min.lee.lim@intel.com if you are interested to apply. Thanks.